Wafer XRD 200 X-ray diffractometer with automated wafer sorting and crystal orientation

Based on the azimuthal scan, Wafer XRD 200 is an ultra-fast, high precision and fully equipped solution for wafer metrology, with a multitude of additional options.

Wafer XRD 200 is your fully equipped and automized X-ray diffraction system for wafer production and research, providing high speed and accuracy.

The azimuthal scan method requires only one measuring rotation to gather all the necessary data to fully determine the orientation, which delivers the results within 10 seconds while not compromising accuracy.

The sample is rotated 360°, with the X-ray source and detector positioned to achieve a certain number of reflections per turn. These reflections enable the orientation of the crystal lattice to be measured in relation to the rotation axis with high precision of up to 0,003°.

Able to measure a full cassette of 25 wafers in less than 10 minutes, Wafer XRD 200 does this completely independently, making it a powerful and efficient element in your QC process.

Operating costs are low for the Wafer XRD 200, thanks to its low energy consumption and air-cooled X-ray tube – no water cooling is required.

The instrument can be easily integrated into existing processes in production environments using its various MES, SECS/GEM and similar interfaces.

Wafer XRD 200 makes you understand your materials like never before, being able to measure:

Wafer XRD 200 is well-equipped for production environments in which a large number of samples need to be analyzed quickly.

It can measure samples with up to 200mm of diameter, with high stability due to measuring one defined material from the below:

Automation is a necessity in this fast-paced industry – and the Wafer XRD 200 is leading the charge as a practical, powerful solution to manage wafer handling, sorting, and in-depth measurements of crystal orientation, optical notch and flat determination, resistivity measurements, and other important parameters. Experience the increased productivity for yourself!

Understanding your materials accurately and quickly is the key to great quality control, and the Wafer XRD 200 is the ideal solution. Using the ultra-fast Omega-Scan method, it determines crystal orientation within a single measurement – giving you your results in five seconds. With additional functionality including resistivity measurement and geometric feature determination the Wafer XRD 200 offers unparalleled efficiency and versatility for production quality control.

Not every busy environment is a production environment – Wafer XRD 200 is equally equipped to provide high-throughput analysis in R&D environments alike. Able to characterize hundreds of different materials, from Si, SiC, and GaAs to quartz, LiNbO3, and BBO, the Wafer XRD 200 has the versatility to support your materials research and innovation assisting you in shaping the future of semiconductor technology.